Prall K. CMOS Plasma and Process Damage 2025
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Prall K. CMOS Plasma and Process Damage 2025
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Category: Other
Total size: 74.25 MB
Added: 3 days ago (2025-06-10 18:26:01)
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Info Hash: 39F00CD9B1F184A1E3551B627BC4E3F8CD472BD1
Last updated: 4 minutes ago (2025-06-14 04:49:59)
Description:
Textbook in PDF format
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems